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Title:
APPARATUS AND METHOD FOR REDUCING EROSION RATE OF SURFACE EXPOSED TO HALOGEN-CONTAINING PLASMA
Document Type and Number:
Japanese Patent JP2012116749
Kind Code:
A
Abstract:

To provide a ceramic article resistant to erosion by a halogen-containing plasma used in semiconductor processing.

The ceramic article includes ceramic which is multi-phased, typically including at least two phases or three phases. In a first embodiment, the ceramic is formed from yttrium oxide at a molar concentration ranging from about 50 mol% to about 75 mol%; zirconium oxide at a molar concentration ranging from about 10 mol% to about 30 mol%; and at least one other component, selected from the group consisting of aluminum oxide, hafnium oxide, scandium oxide, neodymium oxide, niobium oxide, samarium oxide, ytterbium oxide, erbium oxide, cerium oxide, and combinations thereof, at a molar concentration ranging from about 10 mol% to about 30 mol%.


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Inventors:
SUN JENNIFER Y
DUAN REN-GUAN
YUAN JIE
XU LI
COLLINS KENNETH S
Application Number:
JP2012001609A
Publication Date:
June 21, 2012
Filing Date:
January 06, 2012
Export Citation:
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Assignee:
APPLIED MATERIALS INC
International Classes:
C04B35/50; H01L21/3065
Domestic Patent References:
JPS63252963A1988-10-20
JPH04130055A1992-05-01
JP2007505813A2007-03-15
JPH09186140A1997-07-15
JP2006507662A2006-03-02
JP2008239385A2008-10-09
JP2007505813A2007-03-15
JPH09186140A1997-07-15
JP2006507662A2006-03-02
Foreign References:
WO2007008999A22007-01-18
WO2007008999A22007-01-18
Attorney, Agent or Firm:
Yoshiaki Anzai



 
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