To allow a silicone oxide film of high quality to be formed in a narrow space at low temperature.

A device for manufacturing a silicone oxide film of this embodiment comprises: a spin coating unit for forming a polymer film by rotary coating of a solution prepared by dissolving a polymer having silazane bonds in an organic solvent; a transportation mechanism for transporting a substrate with the polymer film formed by the spin coating unit into an oxidation unit without contacting the polymer film; and an oxidation unit for transforming the polymer film into a silicone oxide film by performing any of a process for immersing the polymer film into a heated solution containing hydrogen peroxide, a process for spraying the heated solution containing hydrogen peroxide to the polymer film, and a process for exposing reaction gas containing vaporized hydrogen peroxide to the polymer film, when the substrate is transported by the transportation mechanism. The process for forming a polymer film by the spin coating unit and a process for transforming the polymer film into a silicon oxide film by the oxidation unit are completed in one device.