Title:
ETCHING CONTROL DEVICE
Document Type and Number:
Japanese Patent JP2683224
Kind Code:
B2
Abstract:
PURPOSE: To provide the control device which enables accurate detection of change in composition of an etching solution without being affected by the change in flow velocity of the etching solution that flows through the inside of a case.
CONSTITUTION: In this control device, an etching solution poured into a sampling vessel at a point on one side of a weir 31 flows through the sampling vessel while flowing over the top of the weir 31. The weir 31 has a notched part in its upper end section and the tip of a sample electrode 11 consisting of a metal to be etched with the etching solution is immersed in the etching solution at a position where the tip of the electrode 11 is inserted into the notched part. Also, a counter electrode 12 corroded with the etching solution is immersed in the etching solution and the current passing through the etching solution between the sample electrode 11 and the counter electrode 12 or the potential difference between them is measured and based on the measured value, the etching solution is replenished with its components.
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Inventors:
Katsuo Akasegawa
Application Number:
JP4854595A
Publication Date:
November 26, 1997
Filing Date:
March 08, 1995
Export Citation:
Assignee:
Nippon Aqua Co., Ltd.
International Classes:
G01N27/26; C23F1/08; G01N27/416; (IPC1-7): C23F1/08
Domestic Patent References:
| JP3197689A |
Attorney, Agent or Firm:
Hisao Komori