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Title:
INTEGRATED CIRCUIT WITH IMPROVED TAB TIE
Document Type and Number:
Japanese Patent JPS6421950
Kind Code:
A
Abstract:
PURPOSE: To eliminate the need of an extra space for forming electrical connection between the source region of a field effect transistor and a doped silicon semiconductor tab region for forming the transistor by forming a metal silicide on the source region and its adjacent tab contact region. CONSTITUTION: In an integrated circuit containing both p- and n-channel field effect transistors formed on a silicon body 100, at least one transistor, for example, M20 and M21 are formed in tabs 101 and 102 formed in the body 100 and the sources 103 and 111 of the transistors M20 and M21 are electrically connected to tabs 101 and 102 with tab ties 106 and 111. The ties 106 and 112 comprises a metal silicide and are brought into contact with adjacent strongly doped contact areas 105 and 113. The silicide can be titanium silicide, tantalum silicide, molybdenum silicide, tungsten silicide, etc.

Inventors:
MINNRIAN CHIEN
CHIYUN UEI REUN
DANIERU MAAKU ROOJI
Application Number:
JP15244788A
Publication Date:
January 25, 1989
Filing Date:
June 22, 1988
Export Citation:
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Assignee:
AMERICAN TELEPHONE & TELEGRAPH
International Classes:
H01L21/8238; H01L23/485; H01L27/092; (IPC1-7): H01L27/08
Domestic Patent References:
JPS60120571A1985-06-28
JPS59208773A1984-11-27
Attorney, Agent or Firm:
Masao Okabe (2 outside)