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Patent Searching and Data


Title:
MASK PATTERN CORRECTION METHOD, MASK PATTERN CORRECTION DEVICE AND PROGRAM THEREFOR
Document Type and Number:
Japanese Patent JP2008070729
Kind Code:
A
Abstract:

To prevent occurrence of a dimensional error and to improve a yield of a product and throughput.

A polarization change calculating section 11 calculates distribution of change values in characteristics values that change between a polarization state of incident light entering a photomask and a polarization state of exiting light exiting from the photomask where the incident light enters. Then a correction section 21 corrects a mask pattern based on the distribution of calculated change values.


Inventors:
IWASE KAZUYA
Application Number:
JP2006250721A
Publication Date:
March 27, 2008
Filing Date:
September 15, 2006
Export Citation:
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Assignee:
SONY CORP
International Classes:
G03F1/36; G03F1/68; G03F1/70; G03F7/20; H01L21/027
Domestic Patent References:
JPH0912323A1997-01-14
JP2003515192A2003-04-22
JP2004047737A2004-02-12
JP2004087987A2004-03-18
JP2005005521A2005-01-06
JP2005311187A2005-11-04
JP2006114904A2006-04-27
JP2006251781A2006-09-21
JP2006267997A2006-10-05
JP2007121413A2007-05-17
Attorney, Agent or Firm:
Takahisa Sato