Title:
MASK PATTERN CORRECTION METHOD, MASK PATTERN CORRECTION DEVICE AND PROGRAM THEREFOR
Document Type and Number:
Japanese Patent JP2008070729
Kind Code:
A
Abstract:
To prevent occurrence of a dimensional error and to improve a yield of a product and throughput.
A polarization change calculating section 11 calculates distribution of change values in characteristics values that change between a polarization state of incident light entering a photomask and a polarization state of exiting light exiting from the photomask where the incident light enters. Then a correction section 21 corrects a mask pattern based on the distribution of calculated change values.
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Inventors:
IWASE KAZUYA
Application Number:
JP2006250721A
Publication Date:
March 27, 2008
Filing Date:
September 15, 2006
Export Citation:
Assignee:
SONY CORP
International Classes:
G03F1/36; G03F1/68; G03F1/70; G03F7/20; H01L21/027
Domestic Patent References:
JPH0912323A | 1997-01-14 | |||
JP2003515192A | 2003-04-22 | |||
JP2004047737A | 2004-02-12 | |||
JP2004087987A | 2004-03-18 | |||
JP2005005521A | 2005-01-06 | |||
JP2005311187A | 2005-11-04 | |||
JP2006114904A | 2006-04-27 | |||
JP2006251781A | 2006-09-21 | |||
JP2006267997A | 2006-10-05 | |||
JP2007121413A | 2007-05-17 |
Attorney, Agent or Firm:
Takahisa Sato