Title:
プロセスパラメータを決定するための方法及び装置
Document Type and Number:
Japanese Patent JP7189719
Kind Code:
B2
Abstract:
A method for processing a substrate in a processing chamber using at least one time trace based prediction model is provided. A substrate is dry processed, where the dry processing creates at least one gas by-product. A concentration of the at least one gas by-product is measured. A time trace of the concentration of the at least one gas by-product is determined. The determined time trace of the concentration is provided as input for the at least one time trace based prediction model to obtain at least one process output. The at least one process output is used to adjust at least one process parameter.
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Inventors:
Yasin Kaboji
Luc Albarede
Luc Albarede
Application Number:
JP2018188050A
Publication Date:
December 14, 2022
Filing Date:
October 03, 2018
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
H01L21/3065
Domestic Patent References:
| JP2013161913A | ||||
| JP2003077782A | ||||
| JP2005536074A |
Foreign References:
| US20170084503 | ||||
| WO2014123028A1 |
Attorney, Agent or Firm:
Patent Attorney Corporation Meisei International Patent Office