Title:
PHOTOMASK RESTORING DEVICE AND PHOTOMASK RESTORING METHOD
Document Type and Number:
Japanese Patent JP2023171699
Kind Code:
A
Abstract:
PURPOSE: To provide a method for self-restoring a pseudo SEM image generated from design data to an original image by selecting a restoring object based on defect data, relating to a photomask restoring device and a photomask inspection method.CONSTITUTION: A method for restoring a pseudo image to an original image comprises: a nozzle that sprays gas onto a surface of a photomask; a stage that holds the photomask; means for detecting and amplifying secondary electrons to obtain a SEM image; a defect database that stores defect data; a design data base storing design data; means for extracting defect data of a photomask to be restored at the time of defect restoration, extracting defective design data, and generating a pseudo SEM image suitable for the photomask process; and restoring means for, based on the pseudo SEM image, injecting gas from a nozzle to a portion corresponding to the SEM image on the defective photomask, and performing one or both of etching and deposition to perform restoring.SELECTED DRAWING: Figure 1
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Inventors:
YAMADA KEIZO
Application Number:
JP2022083459A
Publication Date:
December 04, 2023
Filing Date:
May 21, 2022
Export Citation:
Assignee:
HORON KK
International Classes:
G03F1/74; H01J37/28
Attorney, Agent or Firm:
Morihiro Okada