PHOTOSENSITIVE TRANSFER MATERIAL, METHOD OF FORMING RESIN PATTERN, SUBSTRATE HAVING RESIN PATTERN, DISPLAY ELEMENT, AND DISPLAY

Title:

PHOTOSENSITIVE TRANSFER MATERIAL, METHOD OF FORMING RESIN PATTERN, SUBSTRATE HAVING RESIN PATTERN, DISPLAY ELEMENT, AND DISPLAY

Document Type and Number:

Japanese Patent JP2010072589

Kind Code:

A

Abstract:

To provide a photosensitive transfer material having excellent followability to a photosensitive resin layer to be transferred to an uneven shape of the surface to be transferred and permits uniform development even in one-time development process when forming a resin pattern.

This photosensitive transfer material includes the photosensitive resin layer with the melting viscosity at 110 C of 10,000-30,000 Pa s on a temporary support body with the thickness of 12-40 m.

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Inventors:

GOTO HIDENORI
YOSHINARI SHINICHI

Application Number:

JP2008243106A

Publication Date:

April 02, 2010

Filing Date:

September 22, 2008

Export Citation:

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Assignee:

FUJIFILM CORP

International Classes:

G03F7/004; G02B5/20; G02F1/1335; G02F1/1339

Attorney, Agent or Firm:

Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda

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