PURPOSE: To easily produce a black matrix layer having sufficient light shieldability and pattern accuracy and low reflectivity.

CONSTITUTION: Transistor elements 20 and display electrodes 7 are formed on a glass substrate 1 and a photoresist layer 15 of a negative type is formed over the entire surface of the substrate. This resist layer is subjected to back exposing from the rear surface side of the glass substrate 1 with the TR elements 20 as a mask and after the non-exposed parts of the resist layer 15 are removed by development, a hydrophilic resin layer 16 is formed over the entire surface of the substrate (Fig. (a)). This hydrophilic resin layer 16 is partly peeled away by lifting off the remaining resist layer 15 (Fig. (b)). The remaining hydrophilic resin layer 16 is impregnated with a metallic compd. to serve as a catalyst for electroless plating and is then subjected to the electroless plating, by which the hydrophilic resin layer is formed as the black matrix layer having the light shieldability.