Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7373354
Kind Code:
B2
Abstract:
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the salt.SOLUTION: The salt represented by formula (I) and the resist composition containing the same are provided. [In the formula, Qand Q, and Rand Reach represent a fluorine atom, a perfluoroalkyl group or the like; z represents an integer of 0-6; Xrepresents *-CO-O- or the like; Lrepresents a single bond or a methylene group; Rrepresents a hydrogen atom, a group represented by formula (1a) or a group represented by formula (2a); Zrepresents an organic cation; R, Rand Reach represent an alkyl group; naa represents 0 or 1; Rand Reach represent a hydrogen atom or an alkyl group; Rrepresents an alkyl group; Xrepresents an oxygen atom or a sulfur atom; m3 represents an integer of 1-3; Rrepresents a halogen atom, a hydroxy group, an alkyl group or the like; and m4 represents an integer of 0-4.]SELECTED DRAWING: None
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Inventors:
Katsuhiro Komuro
Takahiro Yasue
Koji Ichikawa
Takahiro Yasue
Koji Ichikawa
Application Number:
JP2019190328A
Publication Date:
November 02, 2023
Filing Date:
October 17, 2019
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C381/12; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP201825789A | ||||
| JP6973279B2 | ||||
| JP7139190B2 | ||||
| JP201440387A | ||||
| JP7091760B2 | ||||
| JP201146694A | ||||
| JP201039476A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP