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Patent Searching and Data


Title:
SEMICONDUCTOR SUBSTRATE POLISHING DEVICE
Document Type and Number:
Japanese Patent JP2000263420
Kind Code:
A
Abstract:

To improve the removing performance of a foreign matter accumulated on a dresser by generating ultrasonic waves in pure water in the washing of the dresser.

This device has a washing tank 31 for a dresser 28, and an ultrasonic wave generator 32 is provided within the washing tank 31 filled with pure water. The washing tank 31 also has a drain port 41 for draining the waste water after washing in the washing tank 31. The dresser 28 is moved to the washing tank 31 by a rocking rotating arm after the dressing of an abrasive pad 21 of hard material is ended. Thereafter, the whole dresser 28 is lowered just under the level 42 of the pure water in which ultrasonic waves are generated, and washed in the left state. The washing time is differed depending on the composition or accumulation degree of the abrasive foreign matter, and when the foreign matter is CeO2, it is about 3-10 min. After washing, the dresser 28 is raised from the level 42 and dried by its own rotation. The waste water after washing in the washing tank 31 is drained through the drain port 41 during the drying of the dresser 28. Thereafter, the washing tank 31 is again filled with pure water.


Inventors:
KAJIWARA MAKOTO
MORIYAMA SHIGEO
KUGAYA TAKASHI
ISHIDA YOSHIHIRO
FURUKAWA TAKAYASU
OTSUKI SHIGEO
SUZUKI YUKIO
TOGAWA KENICHI
HOUTSUKI MASAHIRO
INAYOSHI KENJI
OWADA SHUICHI
Application Number:
JP7314399A
Publication Date:
September 26, 2000
Filing Date:
March 18, 1999
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
B24B53/017; H01L21/304; (IPC1-7): B24B37/00; H01L21/304
Attorney, Agent or Firm:
Ogawa Katsuo