シミュレーション方法及び装置 - Fujitsu Microelectronics Limited

Title:

シミュレーション方法及び装置

Document Type and Number:

Japanese Patent JP4202214

Kind Code:

B2

Abstract:

The simulation equipment has division unit for dividing a layout of a photo mask (mask layout) into a plurality of areas, average light intensity value calculation unit for calculating an average value of light intensity in each of the areas, smoothing unit for subjecting the calculated average value to smoothing processing, and multiplication unit for multiplying the smoothed average value by a predetermined multiplier.

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Inventors:

Hiroki Futani
Ryo Asai

Application Number:

JP2003308919A

Publication Date:

December 24, 2008

Filing Date:

September 01, 2003

Export Citation:

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Assignee:

Fujitsu Microelectronics Limited

International Classes:

G03F1/36; G03F1/68; G06F17/50; G06G7/62; G06K9/00; H01L21/027

Domestic Patent References:

JP2001272766A
JP2001222097A
JP2001337441A
JP2001052999A

Attorney, Agent or Firm:

Takayoshi Kokubun

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