Title:
An exposure device, an exposure method, a device manufacturing method
Document Type and Number:
Japanese Patent JP6115610
Kind Code:
B2
Abstract:
An exposure apparatus configured to expose a substrate (P) through a projection optical system (PL) and a liquid immersion area (AR1) formed by a liquid (LQ) supplied to an image plane side of the projection optical system by a supply port (12), the exposure apparatus comprising a stage (PST) which has a substrate holding portion (PH) adapted to hold the substrate, and which is movable with respect to the projection optical system on the image plane side of the projection optical system, wherein the upper surface of the stage has a liquid repellency against the liquid (LQ) to be supplied from the supply port (12).
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Inventors:
Yuichi Shibasaki
Application Number:
JP2015201563A
Publication Date:
April 19, 2017
Filing Date:
October 09, 2015
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20; G03F9/00; H01L21/027; H01L21/68; H01L21/683
Domestic Patent References:
| JP2004289127A | ||||
| JP2002200453A | ||||
| JP64088542A |
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Shinji Kato
Hiroshi Otani
Kobayashi Hideyoshi
Shinji Kato
Hiroshi Otani