Title:
A stage device and an electron beam device
Document Type and Number:
Japanese Patent JP6139449
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To reduce the generation of particles in a stage device.SOLUTION: A stage device where a sample to be processed by an electron beam is mounted and an electron beam device are provided. The stage device includes: an insulating substrate; a chucking electrode that is provided on the insulating substrate; a plurality of support parts that are formed of a conductive material on a surface of the insulating substrate and support the sample; and a support part potential control unit that controls the potentials of the plurality of support parts. The electron beam device includes: the stage device; and an irradiation unit that irradiates the sample with an electron beam.
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Inventors:
Seyama Masahiro
Application Number:
JP2014063987A
Publication Date:
May 31, 2017
Filing Date:
March 26, 2014
Export Citation:
Assignee:
Advantest Corporation
International Classes:
H01J37/20
Domestic Patent References:
| JP2008135736A | ||||
| JP2001035907A | ||||
| JP2004022888A | ||||
| JP11067885A | ||||
| JP7029814A | ||||
| JP2000243822A | ||||
| JP2003059910A |
Foreign References:
| WO2007014160A2 |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation