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Patent Searching and Data


Title:
DEVICE FOR MANUFACTURING VAPOR DEPOSITION MASK AND METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
Document Type and Number:
WIPO Patent Application WO/2022/149350
Kind Code:
A1
Abstract:
This device for manufacturing a vapor deposition mask has a support base material having a first surface for supporting a member subject to plating, a first support member and a second support member provided so as to surround the outer periphery of the member subject to plating on the first surface, and an electrode part provided so as to be set apart from the first surface by a prescribed height. The first support member has a first wall part provided on the first surface, and a first eave part projecting toward the inner side of the first surface at the upper section of the first wall part. The second support member has a second wall part provided on the first surface, and a second eave part projecting toward the inner side of the first surface at the upper section of the second wall part. The first wall part has a first portion in which the height decreases to a prescribed height from the first surface, and a first step part formed on the inner side surface of the first wall part due to the first portion. The second wall part has a second step part formed by the electrode part projecting, at a prescribed height from the first surface, on the inner-side surface of the second wall part.

Inventors:
KIMURA RYOTARO (JP)
Application Number:
PCT/JP2021/042022
Publication Date:
July 14, 2022
Filing Date:
November 16, 2021
Export Citation:
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Assignee:
JAPAN DISPLAY INC (JP)
International Classes:
C23C14/04; C25D1/10
Foreign References:
JPS6156293A1986-03-20
CN109576642A2019-04-05
JP2019533632A2019-11-21
Attorney, Agent or Firm:
TAKAHASHI, HAYASHI AND PARTNER PATENT ATTORNEYS, INC. (JP)
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