Title:
RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2022/149349
Kind Code:
A1
Abstract:
A radiation-sensitive composition comprising a polymer (A) that includes a structural unit represented by formula (i), and an acid-generating compound (excluding said polymer (A)) that has a radiation-sensitive onium cation and an organic anion, and satisfying requirement [K1] and/or requirement [K2]. [K1]: The polymer (A) has a radiation-sensitive onium cation [X] having two or more of at least one type of substituent group β selected from the group consisting of fluoroalkyl groups and fluoro groups (excluding a fluoro group in a fluoroalkyl group). [K2]: The acid-generating compound includes a compound having a radiation-sensitive onium cation [X].
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Inventors:
MARUYAMA KEN (JP)
Application Number:
PCT/JP2021/041884
Publication Date:
July 14, 2022
Filing Date:
November 15, 2021
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; G03F7/039; G03F7/20
Foreign References:
| JP2020181064A | 2020-11-05 | |||
| JP2020183375A | 2020-11-12 | |||
| JP2020187349A | 2020-11-19 | |||
| JP2018197853A | 2018-12-13 | |||
| JP2018159744A | 2018-10-11 |
Attorney, Agent or Firm:
YAMADA, Tsuyoshi (JP)
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