Title:
EVAPORATION SOURCE UNIT, FILM FORMATION DEVICE, AND FILM FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2024/116669
Kind Code:
A1
Abstract:
Provided is an evaporation source unit that forms a film on a substrate that moves relative to a movement direction, and is characterized by comprising: a first evaporation source group that includes a plurality of first evaporation sources which are arranged along an intersecting direction intersecting the movement direction and which each release a first vapor deposition substance to be attached to the substrate; a second evaporation source group that is disposed further outward than the first evaporation source group in the movement direction and that includes a plurality of second evaporation sources which are disposed along the intersecting direction and which each release a second vapor deposition substance to be attached to the substrate; a first quartz monitor that monitors the state of the first vapor deposition substance released from the first evaporation sources; and a second quartz monitor that monitors the state of the second vapor deposition substance released from the second evaporation sources. The evaporation source unit is characterized in that the amount of the second vapor deposition substance released from the second evaporation sources and attached to the second quartz monitor is smaller than the amount of the first vapor deposition substance released from the first evaporation sources and attached to the first quartz monitor.
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Inventors:
SUGIMOTO MIYU (JP)
Application Number:
PCT/JP2023/038675
Publication Date:
June 06, 2024
Filing Date:
October 26, 2023
Export Citation:
Assignee:
CANON TOKKI CORP (JP)
International Classes:
C23C14/24; H01L21/363; H10K50/10; H10K71/16
Domestic Patent References:
| WO2017010512A1 | 2017-01-19 |
Foreign References:
| JP2014129568A | 2014-07-10 | |||
| JP2011042868A | 2011-03-03 | |||
| JP2005206896A | 2005-08-04 |
Attorney, Agent or Firm:
OHTSUKA PATENT OFFICE, P.C. (JP)
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