SURFACE WAVE EXCITATION PLASMA PROCESSING SYSTEM

WIPO Patent Application WO/2006/120904

A1

[PROBLEMS] To sustain uniform generation of plasma constantly over a large area. [MEANS FOR SOLVING PROBLEMS] A plasma source (10) comprises a microwave generator, a microwave waveguide (12) and a dielectric block (13), and a plasma source (20) also comprises a microwave generator, a microwave waveguide (22) and a dielectric block (23) similarly. The lid (3) of a chamber (1) is fixed with the microwave waveguides (12, 22) in parallel, and the dielectric blocks (13, 23) are arranged in the chamber (1). A reflector (30) is interposed between the dielectric blocks (13, 23) so that electromagnetic waves (microwaves) propagating through the dielectric blocks (13, 23) are prevented from advancing into counterpart dielectric blocks as reflection waves. Consequently, the plasma sources (10, 20) are controlled independently. Furthermore, a side reflector (40) is arranged at the outer circumference of each of dielectric blocks (23, 13) so that a standing wave of the electromagnetic wave propagating through the dielectric blocks (13, 23) is formed thus forming a large-area standing wave mode of surface wave SW uniformly.

JP5881954	Plasma generator
JPH1150272	PLASMA PROCESS DEVICE
JP7121786	Substrate processing apparatus, semiconductor device manufacturing method, and substrate processing method

SUZUKI MASAYASU (JP)
SARUWATARI TETSUYA (JP)

PCT/JP2006/308732

November 16, 2006

April 26, 2006

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SHIMADZU CORP (JP)
SUZUKI MASAYASU (JP)
SARUWATARI TETSUYA (JP)

H05H1/46; H01L21/205; H01L21/3065; H01L21/31

JP2005033100A	2005-02-03
JP2004285396A	2004-10-14

Kita, Toshifumi c/o SHIMADZU CORPORATION (1 Nishinokyo-kuwabaracho, Nakagyo-k, Kyoto-shi Kyoto 11, JP)

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