TREATING DEVICE USING TREATING GAS, AND METHOD OF OPERATING THE SAME

WIPO Patent Application WO/2003/019639

A1

A treating device (10) includes a treating vessel (11) for effecting a treatment, such as etching, using a treating gas therein, and a gas feeding mechanism (15) for feeding the treating gas into the treating vessel (11). Further, the treating device (10) includes a gas discharging mechanism (14) for discharging the gas after treatment from the treating vessel (11), and a gas circulating mechanism (21) for returning part of the gas being discharged by this gas discharging mechanism (14) into the treating vessel (11). The gas discharging mechanism (14) and gas circulating mechanism (21) are provided with heaters (22A, 22B) for heating them to prevent accumulation of impurities.

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NAGASEKI KAZUYA (JP)
HIRAYAMA YUSUKE (JP)

PCT/JP2002/008829

March 06, 2003

August 30, 2002

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TOKYO ELECTRON LTD (JP)
NAGASEKI KAZUYA (JP)
HIRAYAMA YUSUKE (JP)

B01J19/08; C23F4/00; H01J37/32; H01L21/00; H01L21/205; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): H01L21/3065; B01J19/08; C23F4/00; H01L21/205; H01L21/31

JPH11162943A	1999-06-18
JP2001185544A	2001-07-06
JPH10125657A	1998-05-15
JP2002217166A	2002-08-02
JP2000068212A	2000-03-03
JPH0997785A	1997-04-08

Yoshitake, Kenji (Room 323 Fuji Bldg., 2-3, Marunouchi 3-chom, Chiyoda-ku Tokyo, JP)

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