MANUFACTURE OF MASK AND MASK PATTERN DATA FORMING DEVICE AS WELL AS RECORDING MEDIUM

Title:

MANUFACTURE OF MASK AND MASK PATTERN DATA FORMING DEVICE AS WELL AS RECORDING MEDIUM

Document Type and Number:

Japanese Patent JP2001022049

Kind Code:

A

Abstract:

To manufacture a mask with shorter steps and to shorten an exposure time.

This process for manufacture of the mask consists in independently forming the data on the identification and scribe patterns including a device pattern, scribe pattern enclosing the device pattern and the process identification pattern formed within the scribe region indicated by the scribe pattern and the data on the outer peripheral pattern which is formed on the outer side of the outer periphery of the scribe region and precludes the process identification pattern and forming the data for an exposure device or inspection device from the data described above. The outer peripheral pattern is divided to the patterns within the plural exposure regions.

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Inventors:

KOMATA TAKETOSHI
SAKURAI MITSUO
OSADA HIDEJI

Application Number:

JP19663699A

Publication Date:

January 26, 2001

Filing Date:

July 09, 1999

Export Citation:

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Assignee:

FUJITSU LTD

International Classes:

G03F1/68; G03F1/70; G03F7/20; H01L21/027; G06F17/50; (IPC1-7): G03F1/08; G06F17/50; H01L21/027

Attorney, Agent or Firm:

Matsumoto Shinkichi

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