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Title:
DEVICE MANUFACTURING METHOD AND SUBSTRATE COMPRISING RADIATION SENSITIVE MATERIAL
Document Type and Number:
WIPO Patent Application WO2005081299
Kind Code:
A3
Abstract:
A method of producing a T-gate in a single stage exposure process using electromagnetic radiation is disclosed.

Inventors:
PELLENS RUDY JAN MARIA (BE)
Application Number:
PCT/EP2005/001836
Publication Date:
March 09, 2006
Filing Date:
February 22, 2005
Export Citation:
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Assignee:
ASML NETHERLANDS BV (NL)
PELLENS RUDY JAN MARIA (BE)
International Classes:
G03F7/004; H01L21/28; G03F7/095; G03F7/20; H01L21/027; H01L21/285
Foreign References:
US6255035B12001-07-03
EP0903779A21999-03-24
Other References:
LEE H-M ET AL: "NEW NANOMETER T-GATE FABRICATED BY THERMALLY REFLOWED RESIST TECHNIQUE", JAPANESE JOURNAL OF APPLIED PHYSICS, PUBLICATION OFFICE JAPANESE JOURNAL OF APPLIED PHYSICS. TOKYO, JP, vol. 42, no. 12B, PART 2, 15 December 2002 (2002-12-15), pages L1508 - L1510, XP001162418, ISSN: 0021-4922
DATABASE INSPEC [online] THE INSTITUTION OF ELECTRICAL ENGINEERS, STEVENAGE, GB; 1998, MALIK S ET AL: "Polymer structural variation towards enhancing KrF resist lithographic properties", XP002351021, Database accession no. 6029566
SAMOTO N ET AL: "SUB-0.1-MUM T-SHAPED GATE FABRICATION TECHNOLOGY USING MIXING-LAYERSIDEWALLS IN A DOUBLE-LAYER RESIST SYSTEM", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 12, no. 6, November 1994 (1994-11-01), pages 3673 - 3676, XP000497183, ISSN: 1071-1023
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