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Title:
SUBSTRATE PROCESSING DEVICE, MANUFACTURING DEVICE AND MANUFACTURING METHOD OF MAGNETIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/100710
Kind Code:
A1
Abstract:
Whether or not to apply the magnetic field to the substrate can be switched according to the quality of the material of a film to form, and both of a magnetic layer and a nonmagnetic layer can be formed within the same chamber. A sputtering device (100) is provided with a substrate holder (102) which supports the substrate (W), a magnetic holder (106) which is arranged around the substrate holder, a magnet (104) which is mounted movably on the magnet holder, support members (103) which are provided on the substrate holder while projecting facing the magnet, connection members (105) which are provided on the magnet while projecting facing the substrate holder, a rotating mechanism (121) which rotationally moves at least one of the substrate holder and the magnet holder, and a connection switch mechanism (122) which when the positions of the support members and the connection members are coincident with each other by rotational moving of the rotating mechanism, vertically moves the substrate holder to cause the support members and the connection members to engage or disengage with respect to each other to switch whether or not to apply the magnetic field to the substrate (W).

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Inventors:
HOSOYA HIROYUKI (JP)
TSUNEKAWA KOJI (JP)
NAGAMINE YOSHINORI (JP)
Application Number:
PCT/JP2009/053844
Publication Date:
September 10, 2010
Filing Date:
March 02, 2009
Export Citation:
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Assignee:
CANON ANELVA CORP (JP)
HOSOYA HIROYUKI (JP)
TSUNEKAWA KOJI (JP)
NAGAMINE YOSHINORI (JP)
International Classes:
C23C14/34; C23C14/24
Foreign References:
JP2002053956A2002-02-19
JP2002050809A2002-02-15
JP2004091845A2004-03-25
JPS61185912A1986-08-19
JPH07173628A1995-07-11
Other References:
KEIICHIRO KON; HIROSHI YASUOKA: "Experiment Physic Lecture 6, Magnetism Measurement I", 15 February 2000, MARUZEN
See also references of EP 2415898A4
Attorney, Agent or Firm:
WATANABE, Keisuke et al. (JP)
Keisuke Watanabe (JP)
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