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WO/2023/203020A1 |
The invention relates to a cleaning device for applying surfaces to be treated with a mixed stream formed of a pressurised gas and CO2 pellets, comprising a device for producing CO2 pellets from liquid or gaseous CO2, wherein the device ...
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WO/2023/114400A9 |
Ophthalmic lenses and method of manufacturing ophthalmic lenses that include automated steps are disclosed.
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WO/2023/201041A1 |
An ice skate blade measurement device comprising a frame configured to couple to an ice skate blade; a measurement system configured to obtain measurement data associated with the ice skate blade; and a control system with computer-execu...
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WO/2023/197237A1 |
A lapping table (100), comprising a rigid body (110), and the rigid body being used for carrying a wafer (20) and provided with a cavity. The lapping table further comprises a plurality of first through holes (V1) passing through the upp...
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WO/2023/200269A1 |
The present invention provides a sub-pad for a polishing pad, a polishing pad including same, and a method for manufacturing the sub-pad for a polishing pad, the sub-pad being stacked under a top pad that contacts and polishes a wafer an...
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WO/2023/197514A1 |
Disclosed in the present application is a ground mortar cleaning actuator, which comprises a ground module, a wall corner module, a transmission module and a translation module, wherein the ground module is configured to clean mortar on ...
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WO/2023/197157A1 |
A sensor (1), a detection device (100), and a detection system. According to the sensor (1), at least one coil group (20) for generating an electromagnetic field is provided on a carrier (10); a channel (30) allowing for the passage of a...
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WO/2023/201189A1 |
Synthesis of polycationic polymer or copolymer is disclosed. The polycationic polymer or copolymer are formed by at least one first cationic monomer and at least one second cationic monomer wherein the first cationic monomer and the seco...
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WO/2023/199545A1 |
Provided is a cutting device comprising a table for cutting, a cutting mechanism, a table for dressing, a housing mechanism, and a transport mechanism. The table for cutting holds an object to be cut. The cutting mechanism uses a blade t...
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WO/2023/194596A1 |
The invention relates to a ventilation device for an abrasive wheel, the abrasive wheel (4) comprising a hollow circular body, a hub intended to be attached to a drive motor shaft, the circular body comprising an abrasive outer surface (...
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WO/2023/194279A1 |
The disclosure relates to a method for manufacturing by machining an ophthalmic device made from a substrate, carrying out a roughing (110, 120) on a face of the substrate and next a finishing (130) on said face of the substrate, the met...
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WO/2023/194721A1 |
The present invention relates to a rotating cutting head (100) comprising a housing (10) with at least two nozzles (20) supported therein, the nozzles are connected to a single line (31) feed by a flow splitting means (30). The at least ...
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WO/2023/195427A1 |
[Problem] To provide a device for cleaning/polishing floors by rotating a brush or sponge in a head section, or the like, wherein the handling of the device is facilitated. [Solution] Provided is a simplified and miniaturized cleaning de...
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WO/2023/195549A1 |
The present invention relates to a disc-type grinder attachable and detachable with one touch, the grinder including: a disc part provided in a form of a disc to perform polishing or cutting by rotation; a pressurization part connected t...
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WO/2023/193438A1 |
A water quality inspection circulating system and method for high-pressure abrasive water jet steel rail grinding. The system comprises a mixing and jetting module, an abrasive separation module (23, 20, 15, 14), an abrasive conveying mo...
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WO/2023/193519A1 |
An automatic ceramic blank finishing and polishing apparatus, comprising a machine frame (1), a workbench (2), and a support frame (3), wherein the workbench (2) and the support frame (3) are both arranged on the machine frame (1), and t...
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WO/2023/194284A1 |
The disclosure relates to a method for manufacturing by machining an ophthalmic device, comprising providing an optical function of the ophthalmic device to be obtained, selecting (100) an initial ophthalmic surface of the ophthalmic dev...
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WO/2023/193079A1 |
The present patent of invention relates to a new type of decorative coating consisting of an assembly comprising as its main element a sheet of natural translucent rock (LR) intercalated with polarised films (PP) which, when exposed to a...
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WO/2023/194595A1 |
The method for shaping a carrier sheet of high hardness, in particular a gres sheet, comprises the steps of providing a solid carrier sheet of high hardness having a thickness of at least 6 mm; covering (S100) a front surface of the carr...
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WO/2023/190008A1 |
This rotary dresser comprises a superabrasive particle layer in which superabrasive particles are bound in a single layer to a base metal by means of a plating layer, the superabrasive particles comprising first superabrasive particles h...
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WO/2023/184634A1 |
The present invention relates to the field of optical thin films, mainly aims at a nodular defect for reducing an optical thin film damage threshold, and particularly relates to a method for improving a thin film laser damage threshold b...
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WO/2023/187844A1 |
Apparatus (100) for working a sheet (200) comprising movement means (111, 112) configured to move at least one sheet (200) at a time in a direction of advance (F), and at least one working unit (113) comprising a working head (123) on wh...
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WO/2023/189512A1 |
Provided is a polishing composition that can achieve an excellent polishing/removal rate for a polishing target. The polishing composition provided by the present invention is used for polishing a polishing target. The polishing composit...
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WO/2023/190604A1 |
Provided is a silicon polishing method and a polishing fluid 26 with which polishing efficiency is achieved. When a polishing pad 18 that is a polishing abrasive grain-including polishing pad including polishing abrasive grains 36 is use...
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WO/2023/184802A1 |
Provided in the present invention are an aspheric prism manufacturing method and an aspheric prism. The method comprises the steps of: S1, by using a thermoforming method, performing integral forming on a prism and lenses to obtain forme...
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WO/2023/192128A1 |
A method of polishing a surface of a polycrystalline sintered ceramic body, the method comprising the steps of: a) providing a sintered ceramic body comprising a polycrystalline material and having a density of from about 99.5% to about ...
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WO/2023/189716A1 |
Provided is a dicing device that can perform a maintenance task well even when a workpiece is large. This dicing device (10) comprises a housing (52) which accommodates in the interior thereof a work table (12) that holds and moves a wor...
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WO/2023/189400A1 |
The present invention provides: a composition for chemical mechanical polishing, the composition being capable of selectively polishing tungsten films by increasing the polishing rate of tungsten films with respect to silicon oxide films...
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WO/2023/191019A1 |
The present invention provides: porous silica particles which have balanced and adequate disintegratability, while having excellent disintegration uniformity; and a method for producing these porous silica particles. Porous silica partic...
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WO/2023/192248A1 |
This disclosure relates to polishing compositions containing at least one abrasive, at least one organic acid or a salt thereof, at least one organic solvent in an amount of from about 3% to about 50% by weight of the composition, and an...
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WO/2023/189113A1 |
A polishing device according to an embodiment comprises: a supporting unit for supporting a polishing tool; a stage for holding an object to be polished; a first drive unit for causing the support unit and the stage to move relative to o...
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WO/2023/187903A1 |
This burnishing tool is for, with respect to a workpiece having a spiral wall, burnishing the inner peripheral surface and the outer peripheral surface of the spiral wall, said tool comprising: a tool body which is to be mounted to a bur...
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WO/2023/189165A1 |
An information processing device (5) comprises: an information acquisition unit (500) that acquires operating status information including top ring status information, polishing table status information, polishing fluid supply nozzle sta...
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WO/2023/190299A1 |
A boron nitride plate surface treatment method according to an embodiment comprises a first polishing step and a second polishing step. In the first polishing step, a surface of a boron nitride plate is polished using a first polishing m...
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WO/2023/189145A1 |
This cooling fluid supply structure comprises: a first supply flow path (101) that passes through the inside of a spindle housing (4a) and penetrates a wall surface of an engaging recess (30d) at the tip thereof; a second supply flow pat...
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WO/2023/189812A1 |
The present invention provides a polishing composition that can realize a high-quality surface. The polishing composition includes silica particles (A), a basic compound (B), a first water-soluble polymer (C1), a second water-soluble pol...
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WO/2023/189701A1 |
The present invention relates to a polishing composition including abrasive grains and a dispersion medium, wherein the pH is less than 5.0, the abrasive grains comprise surface-modified silica particles having an organic acid immobilize...
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WO/2023/184727A1 |
A PCB grinding method, a PCB regrinding device, and a PCB. The PCB grinding method comprises: establishing a board thickness data model, the board thickness data model comprising the board thickness of each hole plugging area before hole...
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WO/2023/190428A1 |
The purpose of the present invention is to provide a polishing pad capable of inhibiting the occurrence of scratches, a method for producing the polishing pad, and a method for polishing the surface of an optical material or semiconducto...
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WO/2023/185202A1 |
Disclosed in the present invention is a wafer polishing system, comprising: a wafer transfer apparatus that comprises a fixing base and a carrying table, the fixing base being capable of driving the carrying table to move in a wafer tran...
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WO/2023/181756A1 |
The present invention pertains to a polishing method and a polishing device for polishing a peripheral portion of a substrate such as a wafer. The polishing method includes: holding a substrate (W) and rotating the substrate (W) by means...
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WO/2023/180880A1 |
A curable composition comprises from 45 to 55 percent by weight of epoxy resin preparable by reaction of epichlorohydrin with at least one of bisphenol A or bisphenol F, from 6 to 12 percent by weight of an at least trifunctional (meth)a...
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WO/2023/183100A1 |
A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, abrasive particles in the liquid carrier, a pyrophosphate compound, and a sulfonate compound or a compound including a quate...
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WO/2023/181810A1 |
The present invention provides a means for speeding up polishing on an object to be polished. Provided is a polishing composition comprising abrasive grains, a dispersion medium, and a water-soluble polymer, wherein the abrasive grains a...
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WO/2023/180555A1 |
The invention relates to a hand grinding machine comprising: a disc tool (40) having a machining face (44) for machining a workpiece (WST); and a machine housing (50) in which a drive motor (11) for driving a tool holder (14) is arranged...
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WO/2023/183488A1 |
An abrasive article including a body including abrasive particles contained within a bond material, a first major surface, a second major surface, and a side surface extending between the first major surface and second major surface, and...
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WO/2023/180554A1 |
The invention relates to a hand grinding machine comprising: a disc tool (40) having a machining face (44) for machining a workpiece (WST); a machine housing (50) in which a drive motor (11) for driving a tool holder (14) is arranged, on...
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WO/2023/180332A1 |
The invention relates to a method for pretreating a component prior to a coating process, comprising the steps of: starting the blasting of the component with a first abrasive; ending the blasting of the component with a first abrasive; ...
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WO/2023/182779A1 |
A device for manufacturing a CMP conditioning disk may comprise: a diamond jig that provides a jig pocket in which a diamond can be seated; a suction unit that selectively provides the jig pocket with a suction force; and a moving unit f...
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WO/2023/180865A1 |
A robotic system for modifying a surface is presented. The system includes a motive robot arm with an arm movement mechanism. The system also includes a tool coupled to the arm movement mechanism. The tool is configured to removably coup...
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