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WO/2024/006405A1 |
A method and apparatus entrain particles in a flow of blast fluid from a flow of transport fluid (4) with particles entrained therein, in which an effectual amount of the transport fluid is vented or extracted prior to the entrainment of...
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WO/2024/004552A1 |
An eyeglass lens processing system that retrieves and transports, using a transport robot, an eyeglass lens processed by an eyeglass lens processing device, wherein: the transport robot is configured to hold, using a holding part, either...
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WO/2024/005281A1 |
The present invention relates to a blade fastening tool for a grinder, in which after the fastening tool is installed on the blade of a grinder driving shaft, a fixing portion is not allowed to further wind along the driving shaft during...
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WO/2024/005732A1 |
The invention relates to method for forming contact surfaces by peeling the insulation on the insulated conductor busbars for energy distribution systems.
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WO/2024/002507A1 |
The invention relates to a method for conditioning the surfaces of heat-treated, galvanised or alloy-galvanised sheet steel components, wherein either at least regions of a sheet steel are heated for the purpose of austenitisation and su...
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WO/2024/004750A1 |
A polishing material slurry according to the present invention comprises: manganese oxide abrasive grains that contain manganese oxide particles; permanganate ions; and phosphoric acids. A polishing method of a polishing material slurry ...
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WO/2024/004223A1 |
The present invention provides a surface treatment member 1 used in a surface treatment system including a rotary member, by being attached to the rotary member. The surface treatment member 1 includes a base 10 and hitting members 40, w...
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WO/2024/003838A1 |
A surface abrading system is presented that includes a robot arm with an end effector on an end of the robot arm. The end effector is configured to couple to an abrasive article. The system also includes a movement mechanism that moves t...
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WO/2024/002018A1 |
A device for automatically measuring a side length of a monocrystal after grinding may include a detection table, a first driver, a mechanical arm and a probe assembly, the detection table is used for placing the monocrystal to be detect...
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WO/2024/001389A1 |
A reciprocating abrasive flow polishing device based on a cavitation effect. A lower sealing plate (3) is hermetically connected to an opening at an upper end of a lower box body (1), and the lower sealing plate (3) can move up and down ...
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WO/2024/002224A1 |
A continuous wafer polishing system, comprising a support (1); polishing units, comprising polishing tables (22) and polishing arms (21); a transmission channel (3), arranged in parallel to the support (1); wafer carrier devices (5), com...
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WO/2023/248033A1 |
Described is a polishing head (1) comprising a first flange (2) for connection to a drive shaft, a protective casing (3), comprising an engaging element (31) operatively connectable to said drive shaft for transmitting a rotary motion to...
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WO/2023/248860A1 |
A device for treating a substrate which comprises: a treatment part in which an aqueous solution containing hydrofluoric acid, nitric acid, and phosphoric acid is fed to the substrate; a collecting part which collects the aqueous solutio...
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WO/2023/248088A1 |
An abrasive article evaluation system is presented that includes a detector that detects a nonvisual abrasive wear cue and an efficiency indication generator that, based on the abrasive wear cue, generates an indication of wear for the a...
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WO/2023/248949A1 |
The objective of the present invention is to provide silica particles, a silica sol, and a polishing composition that have excellent mechanical strength, polishing properties, and storage stability. The present invention relates to silic...
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WO/2023/248086A1 |
An abrasive article evaluation system includes a detector that detects an abrasive wear cue. The system also includes an efficiency indication generator that, based on the abrasive wear cue, generates an indication of wear for the abrasi...
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WO/2023/248087A1 |
An abrasive article evaluation system is presented that includes a camera that images an abrasive article. The system includes an efficiency indication generator that, based on the image, generates an indication of abrasive efficacy for ...
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WO/2023/248201A1 |
The present invention is a structured abrasive article including a substrate having a first major surface and a second major surface, and a plurality of shaped abrasive composites. Each of the shaped abrasive composites includes a bottom...
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WO/2023/248960A1 |
A method, for polishing both sides of a workpiece made of a glass substrate, comprises: (1) a step for starting polishing of the workpiece; (2) a step for monitoring the rotational state of the workpiece in real time; and (3) a step for ...
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WO/2023/249678A1 |
A method of controlling a chemical mechanical polishing system includes receiving a respective time-varying test signal from an endpoint detection system for each of a plurality of test substrates, simultaneously visually displaying the ...
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WO/2023/249903A1 |
A robotic abrading system is presented that includes a robotic arm that causes a workpiece to contact an abrasive article according to a set of operational parameters for an abrasive operation. The system also includes a pre-operation to...
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WO/2023/249602A1 |
A cutting segment (110) for mounting onto a work tool to provide an abrasive operation by the work tool, the cutting segment (110) having first and second side walls (220, 230) extending in an intended direction of motion (M) of the cutt...
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WO/2023/250444A2 |
A tool handle having a grip portion with two parallel attachment legs projecting perpendicular to the grip portion; the grip portion having a threaded hole for mounting a threaded extension pole; the threaded hole located on top of the g...
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WO/2023/249572A1 |
This invention relates to a system (1) that determines whether the level of looseness and grain structure of leather cut pieces used in products produced using 100 % natural leather is in accordance with the customer standards and VDA st...
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WO/2023/250445A1 |
A masonry cutting system having an extension handle assembly with a fork assembly mountable to a right-angle grinder in parallel alignment and with a blade on the grinder oriented vertically, a shroud with a self-adjusting guard and the ...
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WO/2023/248951A1 |
The purpose of the present invention is to provide: silica particles which has excellent mechanical strength, polishing characteristics and storage stability; a silica sol; and a polishing composition. The present invention relates to si...
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WO/2023/244740A1 |
The invention provides a composition for preparing a chemical-mechanical polishing pad via photopolymerization, comprising one or more acrylate urethane oligomers, one or more acrylate monomers and at least one photo-polymerization initi...
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WO/2023/243118A1 |
This honing device comprises: a honing tool (1); a rotary main shaft (2) to which the honing tool (1) is fixed; an axial-direction drive unit (4) that moves the rotary main shaft (2) in the Z-axis direction; a workpiece holder (3) that h...
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WO/2023/241411A1 |
A finishing device, comprising a thrust system (101), a sealing system (102), a conveying pipe system (103), and a recovery system (104), wherein the sealing system (102) comprises a piston (21) and a cylinder body (18) cooperating with ...
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WO/2023/242883A1 |
Position detection unit (10) for a sheet (200) having a perimeter edge (212), comprising a slider (11) and a detection device (13) provided with a detection member (14).
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WO/2023/242471A1 |
A knife sharpener (1), comprising a first grinding drum (2), a second grinding drum (7) and a motor (13) arranged to rotationally drive either or both of the first grinding drum (2) and the second grinding drum (7). A first grinding port...
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WO/2023/241412A2 |
The invention relates to a polishing apparatus, a polishing method and a sealing system. The sealing and polishing apparatus comprises a thrust system; a plurality of sealing systems, wherein each sealing system comprises a piston and a ...
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WO/2023/241408A1 |
A surface finishing method for a micro internal flow channel, a micro internal flow channel workpiece, and a finishing medium. The bore of the micro internal flow channel is less than or equal to 3 mm, and the length-to-diameter ratio of...
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WO/2023/241413A1 |
A pressurizing container, comprising the following segments sequentially distributed from upstream to downstream: a first straight line segment (11) having a length-to-diameter ratio of greater than 5; a second arc segment (12) that is a...
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WO/2023/242481A1 |
The present invention relates to a device (100) for moistening a polishing pad (203). The moistening device (100) comprises measuring means (103, 104, 105, 106, 107, 108, 109, 110) for measuring a physical quantity that is indicative of ...
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WO/2023/244739A1 |
The invention provides a composition for preparing a chemical-mechanical polishing pad via photopolymerization and heating, the composition comprising a first component comprising: one or more acrylate-blocked isocyanates, one or more ac...
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WO/2023/242729A1 |
A finishing station (1) configured for carrying out chamfers and/or slots on a block (5) of friction material of a brake pad (2) including a robotized articulated arm (8) provided with a head (11) rotating around a first axis (A) and car...
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WO/2023/239393A1 |
Exemplary substrate electrochemical planarization apparatuses may include a chuck body defining a substrate support surface. The apparatuses may include a retaining wall extending from the chuck body. The apparatuses may include an elect...
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WO/2023/239421A1 |
A polishing system includes a platen to hold a polishing pad, a carrier head to hold a substrate against the polishing pad, a conditioner including a conditioner head to hold a conditioner disk against the polishing pad, a motor to move ...
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WO/2023/239419A1 |
A chemical mechanical polishing apparatus includes a platen to support a polishing pad, a conditioner head to hold a conditioner disk in contact with the polishing pad, a motor to generate relative motion between the polishing pad and th...
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WO/2023/240260A1 |
A chemical mechanical polishing (CMP) slurry can comprise a plurality of particles distributed in a carrier, wherein at least a portion of the particles of the plurality of particles can have a body including a core comprising zirconia a...
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WO/2023/238452A1 |
[Problem] To provide a grinding system in which the main body of a glass plate can be firmly fixed and which, when the peripheral edges of the main body of the glass plate are ground by pressing the lateral surface (cylindrical portion) ...
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WO/2023/239420A1 |
A polishing system including a platen to support a polishing pad, a carrier head to hold a substrate against the polishing pad, a source of dry ice particles, and a pad conditioner. The pad conditioner includes a compressor to generate a...
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WO/2023/234595A1 |
According to one embodiment of the present invention, provided are a magnesium alloy molded product and a method for manufacturing same, the method comprising: a first step of extruding a magnesium alloy billet into a pipe with a predete...
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WO/2023/233681A1 |
Provided are a polishing head and a polishing treatment device whereby it is possible to address phenomena such as wrinkles and star marks, further improvement of a substrate surface such as SFQR is possible, and polishing treatment of l...
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WO/2023/230846A1 |
A dovetail grinding fixture for a machine tool comprises a bottom plate and a workpiece, one end of the bottom plate is provided with a baffle, the other end of the bottom plate is provided with a second clamping piece, and three fixing ...
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WO/2023/234555A1 |
Transparent ceramic glass for a cooktop, according to one embodiment, may comprise: a glass material including an uneven layer etched on the upper surface thereof; an upper print layer formed on the upper part of the uneven layer; and a ...
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WO/2023/231063A1 |
A grinding device and grinding method for the periphery of an output shaft. The grinding device comprises at least one grinding unit; the grinding unit comprises a mandrel assembling and disassembling mechanism, a grinding mechanism, and...
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WO/2023/234389A1 |
The present invention addresses the problem of providing a wood-cutting cutter which is used for the cutting processing of a woody material and that can be easily reground.　The wood-cutting cutter has a hardened layer provided on a sur...
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WO/2023/234998A1 |
Methods and systems for thinning a device wafer to tens of micron, micron, or sub-micron thicknesses are disclosed. Device wafers are thinned by using a two-step grinding process and a chemical mechanical polish (CMP) process. One or mor...
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