To reduce oscillation or ringing of deflection voltage.
The electron beam equipment comprises a blanking deflector 212 arranged in an electronic mirror cylinder 102 and deflecting an electron beam 200, an amplifier 262 arranged on the outside of the electronic mirror cylinder 102 and applying a voltage to the blanking deflector 212 through a coaxial cable 242 extending to the electronic mirror cylinder 102, and a resistor 232 arranged between the electronic mirror cylinder 102 and the coaxial cable 242 and connected with wiring for applying a voltage to the blanking deflector 212. Since the undulation component of ringing can be attenuated by matching the deflector and a voltage applying section, ringing and oscillation are reduced and response characteristics can be enhanced. As a result, precision of deflection can be enhanced and oscillation in beam position can be suppressed. Consequently, deterioration in beam resolution on the image plane can be suppressed.
COPYRIGHT: (C)2007,JPO&INPIT
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Yuichi Kasai
Tetsuma Ikegami