Title:
PATTERN FORMING METHOD AND PHOTOMASK
Document Type and Number:
Japanese Patent JP2674400
Kind Code:
B2
Abstract:
PURPOSE: To generate patterns of various shapes in the pattern generating method using the edge, of phase shifter.
CONSTITUTION: 1) A stage for exposing by using the mask having the shifter patterns 8 generating the patterns at the peripheral edges and the patterns 8A having a fine line width at which the patterns generated at the peripheral edges overlap on each other to one piece or fine spacings 8B of the shifter patterns at which the patterns generated at the peripheral edges of the shifter patterns overlap on each other to one piece is used in the method for generating the patterns by using the edges of the phase shifters. 2) The shifter patterns 8 generating the patterns at the peripheral edges and the patterns 8A having the fine line width at which the patterns generated at the peripheral edges overlap on each other to one piece or the shifter patterns having the fine spacings 8B of the shifter patterns at which the patterns generated at the peripheral edges of the shifter patterns overlap on each other to one piece are formed.
More Like This:
| JPH05134389 | MASK FOR EXPOSURE |
| JP4491682 | Photomask |
| JP6666951 | Phase inversion blank mask and photomask |
Inventors:
Kenji Nakagawa
Application Number:
JP32936791A
Publication Date:
November 12, 1997
Filing Date:
December 13, 1991
Export Citation:
Assignee:
富士通株式会社
International Classes:
G03F1/34; G03F1/68; H01L21/027; H01L21/30; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
| JP3267940A | ||||
| JP3125150A | ||||
| JP3141354A | ||||
| JP3269532A |
Attorney, Agent or Firm:
Teiichi
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